MEASUREMENT SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS

摘要

PURPOSE: A measurement system, a measurement method, and a lithography apparatus are provided to effectively compensate a slave torsion mode of an object, thereby improving the performance of a system. CONSTITUTION: A measurement system(MS) comprises a location amount sensor and a location amount calculator. The location amount sensor(Xenc) provides each location amount measurement signal. The location amount calculator determines a location amount of an object from the location amount measurement signal. The location amount calculator comprises a torsion estimation device(T) and a bandwidth filter. The torsion estimation device estimates torsion of the object and provides the estimated torsion to a parallel path of the location amount calculator. The location amount calculator corrects the determined location amount with the estimated torsion.