| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a selected area aperture plate, a manufacturing method of the same and the like, in which a fine pore can be formed while maintaining mechanical strength, and which is suitable for observing a selected area electron diffraction image of a TEM. <P>SOLUTION: The manufacturing method of a selected area aperture plate includes: forming a preliminary fabrication region 16 (2 μm or less) by FIB fabrication in an aperture plate 11 composed of a single material such as tantalum or molybdenum with a depth of tens μm or more whose mechanical strength is secured and which screens an electron beam; and next, forming a fine pore 15 of 1 μm or less. Since a side wall portion of this fine pore 15 is formed with a sharp cutting edge and a non-taper shape, an outer periphery outside the fine pore 15 does not transmit even a high energy electron beam of 200 keV to 300 keV. <P>COPYRIGHT: (C)2012,JPO&INPIT |
