发明名称 |
Electron beam writing apparatus and method |
摘要 |
A Z stage is placed on an XY stage in avoidance of an area to which a mark table is fixed. The mask M is placed on a holding mechanism provided on the Z stage. A middle value of the range adjustable by the focal adjustment mechanism is made coincident with the height of the mark table. The height of the mark table is measured and the heights of plural measurement points of the mask M are measured. The Z stage is moved in such a manner that the height of a middle value between highest and lowest values of the heights of these measurement points coincides with the height of the mark table. |
申请公布号 |
US8067753(B2) |
申请公布日期 |
2011.11.29 |
申请号 |
US20090409645 |
申请日期 |
2009.03.24 |
申请人 |
TOUYA TAKANAO;NUFLARE TECHNOLOGY, INC. |
发明人 |
TOUYA TAKANAO |
分类号 |
G21G5/00;G03F1/76;G03F1/78;H01J37/305;H01L21/027 |
主分类号 |
G21G5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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