发明名称 Semiconductor device with trench field plate including first and second semiconductor materials
摘要 In one embodiment, a field effect transistor has a semiconductor body, a drift region of a first conductivity type and a gate electrode. At least one trench extends into the drift region. A field plate is arranged at least in a portion of the at least one trench. A dielectric material at least partially surrounds both the gate electrode and the field plate. The field plate includes a first semiconducting material.
申请公布号 US8044459(B2) 申请公布日期 2011.10.25
申请号 US20080268182 申请日期 2008.11.10
申请人 INFINEON TECHNOLOGIES AUSTRIA AG 发明人 HIRLER FRANZ;RIEGER WALTER;WOOD ANDREW;BORN MATHIAS;SIEMIENIEC RALF;ROPOHL JAN;POELZL MARTIN;BLANK OLIVER;HILLER ULI;HAEBERLEN OLIVER;ZELSACHER RUDOLF;ROESCH MAXIMILIAN;KRUMREY JOACHIM
分类号 H01L29/76;H01L29/94;H01L31/062;H01L31/113;H01L31/119 主分类号 H01L29/76
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