发明名称 EXTREME ULTRAVIOLET LIGHT GENERATOR
摘要 Disclosed is a chamber apparatus which can be used along with at least one laser beam generator. The chamber apparatus may comprise: a chamber which serves the purpose of introducing at least one laser beam emitted from the at least one laser beam generator into the inside of the chamber and which has at least one entrance; a target supply unit which is arranged in the chamber and can supply a target substance to a predetermined zone in the chamber; a laser-focusing optical system which can focus the at least one laser beam in the predetermined zone; and an optical element which can correct the light intensity distribution in a beam cross-section of the at least one laser beam in the predetermined zone.
申请公布号 WO2011122397(A1) 申请公布日期 2011.10.06
申请号 WO2011JP56820 申请日期 2011.03.22
申请人 GIGAPHOTON INC.;WAKABAYASHI OSAMU;YANAGIDA TATSUYA 发明人 WAKABAYASHI OSAMU;YANAGIDA TATSUYA
分类号 H05G2/00 主分类号 H05G2/00
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