| 摘要 |
PROBLEM TO BE SOLVED: To solve such a problem that when a transparent film is exposed, high-definition patterning cannot be performed since resist is exposed as exposure light becomes reflected light which locally varies in intensity owing to presence of electrode wiring, the groove of an exposure stage, etc., as a base.SOLUTION: A forming method for a pattern includes the steps of: forming a light shield film on the transparent film; forming a resist pattern by coating a resist layer on the light shield film and carrying out exposure; removing the light shield film using the resist pattern as a mask; removing the transparent film after removing the light shield film using the resist pattern as the mask; removing the resist pattern; and removing the light shield film on the transparent film after removing the resist pattern. |
