发明名称 METHOD AND DEVICE FOR FORMING CRACK
摘要 <p>A method for forming a crack which can precisely form a crack in a desired direction in substrates made of brittle materials even if the substrate of a large size is placed apart from a correct reference position on the scribe table. According to this method, a crack formation presumed line M is formed following the position separated from a beam travel line L, which is the track of the movement of the center of the beam spot B, by an offset amount O by moving a beam spot B relatively to a substrate G so that the beam travel line L can be in an oblique direction to a reference axis direction X set so as to be coincident with the substantial major axis direction of the beam spot B, and further a cooling spot C is relatively moved following the crack formation presumed line M, and thereby a vertical crack is formed following the crack formation presumed line M.</p>
申请公布号 EP1806202(B1) 申请公布日期 2011.08.17
申请号 EP20050805249 申请日期 2005.10.25
申请人 MITSUBOSHI DIAMOND INDUSTRIAL CO., LTD. 发明人 GONOE, TOGO
分类号 B23K26/36;B23K26/14;B23K26/38;B28D5/00;C03B33/09 主分类号 B23K26/36
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