发明名称 |
SINGLE-CRYSTAL SUBSTRATE, GROUP III ELEMENT NITRIDE CRYSTAL OBTAINED USING SAME, AND PROCESS FOR PRODUICNG GROUP III ELEMENT NITRIDE CRYSTAL |
摘要 |
Provided is a substrate on which a large-area thick crystal of a Group III element nitride can be grown while inhibiting cracking. The substrate is a single-crystal substrate for use in growing a Group III element nitride crystal thereon and satisfies relationship (1): -40 < Z2/Z1 < -1 (1) wherein Z1 is the amount of warpage (µm) of the physical shape of the growth surface of the single-crystal substrate and Z2 is the amount of warpage (µm) calculated from the radius of curvature of the crystallographic surface shape of the growth surface of the single crystal. |
申请公布号 |
WO2011087061(A1) |
申请公布日期 |
2011.07.21 |
申请号 |
WO2011JP50452 |
申请日期 |
2011.01.13 |
申请人 |
MITSUBISHI CHEMICAL CORPORATION;FUJITO KENJI;UCHIYAMA YASUHIRO |
发明人 |
FUJITO KENJI;UCHIYAMA YASUHIRO |
分类号 |
C30B29/38;C23C16/34;C30B19/04;C30B25/20;H01L21/205 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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