发明名称 SINGLE-CRYSTAL SUBSTRATE, GROUP III ELEMENT NITRIDE CRYSTAL OBTAINED USING SAME, AND PROCESS FOR PRODUICNG GROUP III ELEMENT NITRIDE CRYSTAL
摘要 Provided is a substrate on which a large-area thick crystal of a Group III element nitride can be grown while inhibiting cracking. The substrate is a single-crystal substrate for use in growing a Group III element nitride crystal thereon and satisfies relationship (1): -40 < Z2/Z1 < -1 (1) wherein Z1 is the amount of warpage (µm) of the physical shape of the growth surface of the single-crystal substrate and Z2 is the amount of warpage (µm) calculated from the radius of curvature of the crystallographic surface shape of the growth surface of the single crystal.
申请公布号 WO2011087061(A1) 申请公布日期 2011.07.21
申请号 WO2011JP50452 申请日期 2011.01.13
申请人 MITSUBISHI CHEMICAL CORPORATION;FUJITO KENJI;UCHIYAMA YASUHIRO 发明人 FUJITO KENJI;UCHIYAMA YASUHIRO
分类号 C30B29/38;C23C16/34;C30B19/04;C30B25/20;H01L21/205 主分类号 C30B29/38
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