发明名称 |
Exposure equipment having auxiliary photo mask and exposure method using the same |
摘要 |
Example embodiments of the present invention may provide exposure equipment having an auxiliary photo mask. The exposure equipment may include a light source and a first photo mask spaced apart from the light source by a desired distance. A second photo mask may include a third region and a fourth region. An exposure method using the exposure equipment also may be provided.
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申请公布号 |
US7956983(B2) |
申请公布日期 |
2011.06.07 |
申请号 |
US20060635045 |
申请日期 |
2006.12.07 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
NAM DONG-SEOK |
分类号 |
G03B27/44;G03B27/32;G03B27/42;G03B27/54;G03B27/62 |
主分类号 |
G03B27/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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