发明名称 Exposure equipment having auxiliary photo mask and exposure method using the same
摘要 Example embodiments of the present invention may provide exposure equipment having an auxiliary photo mask. The exposure equipment may include a light source and a first photo mask spaced apart from the light source by a desired distance. A second photo mask may include a third region and a fourth region. An exposure method using the exposure equipment also may be provided.
申请公布号 US7956983(B2) 申请公布日期 2011.06.07
申请号 US20060635045 申请日期 2006.12.07
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 NAM DONG-SEOK
分类号 G03B27/44;G03B27/32;G03B27/42;G03B27/54;G03B27/62 主分类号 G03B27/44
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