发明名称
摘要 <p>PROBLEM TO BE SOLVED: To repair a blank defect hard to repair in a defect repairing device using an ion beam. SOLUTION: In the defect repairing device using an ion beam, a blank defect hard to repair is observed with AFM(atomic force microscope) or the like. The probe 1 of a probe microscope made of a carbon nanotube is put directly above the defect 2 to be repaired and pulse voltage is applied to the probe to form a carbon-containing film 4 directly below the probe. In consideration of the consumption of the carbon nanotube as a material, a plurality of carbon nanotube probes are prepared and used under changeover. In the case of a relatively large defect, pulse voltage applied to one- or two-dimensionally arranged carbon nanotube probes is selectively subjected to ON-OFF control in accordance with the shape of the defect to enhance throughput.</p>
申请公布号 JP4676073(B2) 申请公布日期 2011.04.27
申请号 JP20010035797 申请日期 2001.02.13
申请人 发明人
分类号 G03F1/72;G03F1/74;H01J37/30 主分类号 G03F1/72
代理机构 代理人
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