发明名称 Fin field effect transistor and method for forming the same
摘要 Example embodiments are directed to a method of forming a field effect transistor (FET) and a field effect transistor (FET) including a source/drain pair that is elevated with respect to the corresponding gate structure.
申请公布号 US2011092039(A1) 申请公布日期 2011.04.21
申请号 US20100926471 申请日期 2010.11.19
申请人 KIM KEUNNAM;YOSHIDA MAKOTO 发明人 KIM KEUNNAM;YOSHIDA MAKOTO
分类号 H01L21/336 主分类号 H01L21/336
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