发明名称 EXPOSURE DEVICE AND METHOD
摘要 <P>PROBLEM TO BE SOLVED: To form a desired image with a high degree of precision on an exposure surface of a substrate having a poor surface flatness, without using an autofocusing function. <P>SOLUTION: The substrate 1 is supported on a substrate support member 2. A rigid light transmissive member 4 is disposed between a projection optical system 3 and the substrate 1. The light transmissive member 4 has a plane 4a that faces an exposure surface 1a of the substrate 1. The plane 4a is positioned so as to be identical to an image forming plane of the projection optical system 3. A driving mechanism 5 is provided for moving the substrate support member 2 so that the exposure surface 1a is moved close to or away from the plane 4a of the light transmissive member 4. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011081317(A) 申请公布日期 2011.04.21
申请号 JP20090235508 申请日期 2009.10.09
申请人 SAN EI GIKEN INC 发明人 MIYAKE TAKESHI;TAKAGI TOSHIHIRO
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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