APPARATUS AND METHOD FOR IMPROVED CONTROL OF HEATING AND COOLING OF SUBSTRATES
摘要
Methods and apparatus for processing substrates and controlling the heating and cooling of substrates are described. A radiation source providing radiation in a first range of wavelengths heats the substrate within a predetermined temperature range, the substrate being absorptive of radiation in a second range of wavelengths within the first range of wavelengths and within the predetermined temperature rang. A filter prevents at least a portion of radiation within the second wavelength range from reaching the substrate.
申请公布号
WO2011044407(A2)
申请公布日期
2011.04.14
申请号
WO2010US51893
申请日期
2010.10.08
申请人
APPLIED MATERIALS, INC.;KOELMEL, BLAKE R.;TAM, NORMAN L.;RANISH, JOSEPH M.
发明人
KOELMEL, BLAKE R.;TAM, NORMAN L.;RANISH, JOSEPH M.