| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for designing a photomask by which accuracy of predicting a dimensional conversion difference can be enhanced. <P>SOLUTION: The method for designing a photomask includes procedures of: obtaining a dimensional conversion difference based on an analysis index relating to the accuracy of predicting a dimensional conversion difference; carrying out a process proximity correction on the design pattern data after processing; and creating an exposure pattern data from the corrected design pattern data. The analysis index is at least one kind selected from a group of indices about a figure of the pattern to be formed, about an occupancy proportion of the pattern with respect to the substrate surface, and about the diffusion property of a gas component in the space where the processing is carried out. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
