CHEMICALLY AMPLIFIED POSITIVE PHOTOREIST COMPOSITION FOR MICROLENS, MICROLENS FABRICATED BY THE METHOD AND LIQUID CRYSTAL DISPLAY DEVICE INCLUDING THE SAME

摘要

PURPOSE: A chemically amplified photoresist composition for a microlens, the microlens fabricated using the same, and a liquid crystal display device including the microlens are provided to obtain the microlens with the superior profile. CONSTITUTION: A chemically photoresist composition includes a resin, a photo-acid generator, and a quencher. The resin includes a resin with a structural unit represented by chemical formula 1 and a resin with a structural unit represented by chemical formula 2. The protection rate of the resin is between 25 and 40. The weight ratio of the structural unit represented by chemical formula 1 and the structural unit represented by the formula 2 is between 9:1 and 5:5.