发明名称 |
Positive resist compositions and patterning process |
摘要 |
<p>A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising specific recurring units, represented by formula (1). The acid generator (B) is a specific sulfonium salt compound. When processed by lithography, the composition is improved in resolution and forms a pattern with a satisfactory mask fidelity and a minimal LER. Herein R 1 is H or methyl, m is 1 or 2, and n is 1 or 2.</p> |
申请公布号 |
EP2081085(B1) |
申请公布日期 |
2011.03.02 |
申请号 |
EP20090000571 |
申请日期 |
2009.01.16 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
OHSAWA, YOUICHI;KINSHO, TAKESHI;WATANABE, TAKERU |
分类号 |
G03F7/004;G03F7/039;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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