发明名称 METHOD FOR PRODUCING A MICROSTRUCTURE
摘要 The present invention relates to a method for producing a micropattern on a substrate (22), in which a substrate (22) is provided with a relief pattern (26, 28) that exhibits elevations (26) and depressions (28), and in which the elevations (26) and/or depressions (26) are arranged in the form of the desired micropattern, and with a printing tool, an imprint material (30; 34) is transferred to the relief pattern (26, 28), the viscosity of the imprint material (30; 34) being chosen such that the imprint material (30; 34) is selectively transferred either substantially only onto the elevations (26) or substantially only into the depressions (28) of the relief pattern.
申请公布号 US2011045248(A1) 申请公布日期 2011.02.24
申请号 US20080809909 申请日期 2008.12.17
申请人 GIESECKE & DEVRIENT GMBH 发明人 HOFFMULLER WINFRIED;BURCHARD THEODOR;DICHTL MARIUS;RENNER PATRICK;RAHM MICHAEL;HEIM MANFRED;HOFFMANN LARS;DOTZLER MANFRED;LIEBLER RALF;KELLER MARIO
分类号 B32B3/00;B41F17/00;B41F33/00;B81C99/00 主分类号 B32B3/00
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