发明名称 GAS-BARRIER MULTILAYER FILM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a gas-barrier multilayer film which has sufficient gas-barrier properties and sufficiently suppresses deterioration in the gas-barrier properties even when the film is bent. <P>SOLUTION: The gas-barrier multilayer film includes a base and one or more thin layers formed on at least one surface of the base, wherein, in at least one layer of the thin layers, an electron beam transmission curve showing the relation between a distance from a surface of the layer in the film thickness direction of the layer and an electron beam transmission degree has at least one extreme value. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2010260347(A) 申请公布日期 2010.11.18
申请号 JP20100089840 申请日期 2010.04.08
申请人 SUMITOMO CHEMICAL CO LTD 发明人 HASEGAWA AKIRA;KURODA TOSHIYA;TANAKA TOSHIHIKO;ISHITOBI MASAMITSU;SANADA TAKASHI
分类号 B32B9/00;B32B27/00;B32B27/32;B32B27/36;G02F1/1333;G09F9/00;H01L31/042;H01L51/50;H05B33/02;H05B33/04 主分类号 B32B9/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利