| 发明名称 |
Method of Fabricating Metal Nitrogen Oxide Thin Film Structure |
| 摘要 |
A TiON, TaON or ZrON thin film is fabricated through an easy process. The film is corrosion resistant, electric conductive and decorative. The process uses no chloride (Cl) and so is environmental protected. The present disclosure is fit for mass production.
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| 申请公布号 |
US2010283179(A1) |
申请公布日期 |
2010.11.11 |
| 申请号 |
US20100690264 |
申请日期 |
2010.01.20 |
| 申请人 |
ATOMIC ENERGY COUNCIL-INSTITUTE OF NUCLEAR ENERGYRESEARCH |
发明人 |
LU ZIH-SIAN;LIU KENG-SHEN;OU YANG WEN-BIING;WU CHIH-HUNG |
| 分类号 |
B29C71/02 |
主分类号 |
B29C71/02 |
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