发明名称 WAFER WITH INSPECTION ELECTRODE AND REFRACTIVE INDEX MEASURING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To simply and exactly measure refractive indexes of electrodes in a manufacturing process of an optical waveguide element on which optical waveguides and the electrodes are formed. <P>SOLUTION: In the wafer 1 having an electrooptic effect, a plurality of optical waveguides 101; a travelling-wave type control electrode which is constituted by arranging hot electrodes and ground electrodes along the optical waveguides 101 for controlling light to be propagated on the optical waveguides by progressing electric signals between the electrodes; and at least two inspection electrodes 201, 202 which has the same cross-sectional shape and the same extending direction as those of the hot electrodes and has length different from each other are formed. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2010256541(A) 申请公布日期 2010.11.11
申请号 JP20090105195 申请日期 2009.04.23
申请人 SUMITOMO OSAKA CEMENT CO LTD 发明人 MOTOTANI MASAYUKI;KONDO KATSUTOSHI;KANEHARA YUUKI;FUJINO TETSUYA;SUDO MASAAKI;ICHIKAWA JUNICHIRO
分类号 G02F1/035;G02B6/12 主分类号 G02F1/035
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