发明名称 Wafer Backside Structures Having Copper Pillars
摘要 An integrated circuit structure includes a semiconductor substrate having a front side and a backside, and a conductive via penetrating the semiconductor substrate. The conductive via includes a back end extending to the backside of the semiconductor substrate. A redistribution line (RDL) is on the backside of the semiconductor substrate and electrically connected to the back end of the conductive via. A passivation layer is over the RDL, with an opening in the passivation layer, wherein a portion of the RDL is exposed through the opening. A copper pillar has a portion in the opening and electrically connected to the RDL.
申请公布号 US2010276787(A1) 申请公布日期 2010.11.04
申请号 US20100708287 申请日期 2010.02.18
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 YU CHEN-HUA;HUANG HON-LIN;HSU KUO-CHING;CHEN CHEN-SHIEN
分类号 H01L23/48;H01L21/3205;H01L23/498 主分类号 H01L23/48
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