发明名称 FIELD-EFFECT TRANSISTOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a field-effect transistor whose gate insulating layer and channel layer exhibit proper adhesion. Ž<P>SOLUTION: The field-effect transistor has a substrate, and a gate electrode, a gate insulating layer, a channel layer, a source electrode and a drain electrode on the substrate, the gate insulating layer includes gallium oxide, and the channel layer is an organic semiconductor layer. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010212435(A) 申请公布日期 2010.09.24
申请号 JP20090056649 申请日期 2009.03.10
申请人 FUJI XEROX CO LTD 发明人 SHIGEMATSU HIROSHI;YAGI SHIGERU;TORIGOE MASAYUKI;IWANAGA TAKESHI;SHITAYA HIROSHI
分类号 H01L29/786;H01L21/31;H01L21/316;H01L21/336;H01L51/05;H01L51/30;H01L51/40 主分类号 H01L29/786
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