| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition for suppressing the generation of residues after the development of a resist film thereof, while maintaining good adhesion of the resist film to a substrate so as to form a fine resist pattern, and a resist pattern forming method using the same. <P>SOLUTION: The positive resist composition includes (A) an alkali-soluble novolac resin, (B) a photosensitizing agent, and (C) a predetermined benzotriazole-based compound, wherein since the predetermined benzotriazole-based compound is included, good adhesion of a resist film of the composition to a substrate is maintained, a fine resist pattern is formed, and the generation of residues is suppressed even after the development of the resist film. <P>COPYRIGHT: (C)2010,JPO&INPIT |
