发明名称 Method and system for dry development of a multi-layer mask using sidewall passivation and mask passivation
摘要 A method and system for the dry development of a multi-layer mask is described. A first passivation gas comprises as an incipient ingredient a hydrocarbon gas, while a second passivation gas comprises as an incipient ingredient an oxygen-containing gas.
申请公布号 US7767926(B2) 申请公布日期 2010.08.03
申请号 US20060391672 申请日期 2006.03.29
申请人 TOKYO ELECTRON LIMITED 发明人 BALASUBRAMANIAM VAIDYANATHAN
分类号 B23K10/00 主分类号 B23K10/00
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