发明名称 SUBSTRATE FOR GROWING SINGLE CRYSTAL DIAMOND AND METHOD FOR MANUFACTURING SINGLE CRYSTAL DIAMOND USING THE SUBSTRATE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a substrate for growing single crystal diamond capable of heteroepitaxially growing single crystal diamond of high crystallinity and being repeatedly usable, and a method for manufacturing single crystal diamond capable of manufacturing single crystal diamond having a large area and high crystallinity at a low cost. <P>SOLUTION: The substrate for growing single crystal diamond has at least a seed-substrate consisting of a single crystal and a thin film heteroepitaxially grown on the seed-substrate, which is characterized by using single crystal diamond as the seed-substrate and iridium film or rhodium film as the thin film. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010159186(A) 申请公布日期 2010.07.22
申请号 JP20090003102 申请日期 2009.01.09
申请人 SHIN-ETSU CHEMICAL CO LTD 发明人 NOGUCHI HITOSHI
分类号 C30B29/04;C30B25/02;C30B25/20 主分类号 C30B29/04
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