| 摘要 |
PURPOSE: A chemical mechanical polishing slurry composition for polishing a metal wire is provided to minimize the micro erosion generated during a polishing process. CONSTITUTION: A chemical mechanical polishing slurry composition for polishing a metal wire contains an abrasive, an oxidizer, a complexing agent, a corrosion inhibitor, and an additive. The additive is a polymer polymerized from an acrylic monomer, a sulfone monomer, a nitrile monomer, and an amide monomer, or a polymer compound containing more than to polymers.
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