| 摘要 |
Disclosed is a gas purification method, in which at least one gas selected from the group consisting of a hydride gas, a hydrogen halide gas and a halogen gas each containing 10 ppm or less of impurities is purified by using a carbon membrane having a molecular sieving property. The method is applicable to a recycling system for collecting a used gas and re-using the gas as an ultra-high-purity semiconductor material gas, an apparatus or facility for producing an ultra-high-purity semiconductor material gas, or an apparatus or facility in which an ultra-high-purity semiconductor material gas is filled.
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