发明名称 Erosion resistance enhanced quartz used in plasma etch chamber
摘要 A method of fabricating doped quartz component is provided herein. In one embodiment, the doped quartz component is a yttrium doped quartz ring configured to support a substrate. In another embodiment, the doped quartz component is a yttrium and aluminum doped cover ring. In yet another embodiment, the doped quartz component is a yttrium, aluminum and nitrogen containing cover ring.
申请公布号 US7718559(B2) 申请公布日期 2010.05.18
申请号 US20070738030 申请日期 2007.04.20
申请人 APPLIED MATERIALS, INC. 发明人 YUAN JIE;SUN JENNIFER Y.;DUAN RENGUAN
分类号 C03C3/06;C03C3/04 主分类号 C03C3/06
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