EXPOSURE APPARATUS AND METHOD TO MEASURE STRAITNESS THEREOF

摘要

PURPOSE: A maskless exposure device and a method for measuring straightness are provided to implement repeatability and reproducibility by measuring the final exposure straightness. CONSTITUTION: A stage(18) moves a substrate. An optical unit(24) generates a plurality of beams irradiated to the substrate. The optical unit irradiates the plurality of beams in a vertical direction to the stage. The optical unit modulates the emitted beam according to a pattern and irradiates the modulated optical beam to an exposure surface. The controller measures the straightness of the stage by exposing the plurality of beams to the exposure surface of the substrate while moving the stage.