发明名称 LASER APPARATUS, PHOTOTHERAPY APPARATUS, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND OBJECT INSPECTION APPARATUS
摘要 <p>A basic wavelength light generating section generates light of a basic wavelength according to an output wavelength command signal which commands a wavelength of output light from a laser apparatus (1).  An optical amplifier section (20) amplifies the light of the basic wavelength.  A wavelength conversion section (30) comprises nonlinear optical crystals (31, 32, 34, 37, 39, 40) respectively converting wavelengths and temperature adjusters (31a, 32a, 34a, 37a, 39a, 40a) respectively adjusting thereof, and converts the light amplified by the optical amplifier section (20) to light of a wavelength indicated by the output wavelength command signal.  A storage section (60) stores correspondence information indicating a correspondence relation between the wavelength indicated by the output wavelength command signal and the temperature of each nonlinear optical crystal to be set in accordance with the wavelength.  A control section controls each temperature adjuster so that the temperature of the nonlinear optical crystal corresponding to the temperature adjuster becomes the temperature to be set which is determined based on the correspondence information in accordance with the output wavelength command signal.</p>
申请公布号 WO2010041434(A1) 申请公布日期 2010.04.15
申请号 WO2009JP05200 申请日期 2009.10.07
申请人 NIKON CORPORATION;TAKADA, YASUTOSHI;TOKUHISA, AKIRA 发明人 TAKADA, YASUTOSHI;TOKUHISA, AKIRA
分类号 G02F1/39;H01S3/10 主分类号 G02F1/39
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