发明名称 MANUFACTURING METHOD AND MANUFACTURING APPARATUS FOR SEMICONDUCTOR DEVICE
摘要 A manufacturing method for a semiconductor device, including: loading a wafer into a reaction chamber; placing the wafer on a push-up shaft moved up; preheating the wafer under controlling an in-plane temperature distribution of the wafer to be a recess state under a state of placing the wafer on the push-up shaft moved up; lowering the push-up shaft with the wafer kept in the recess state to hold the wafer on a wafer holding member; heating the wafer to a predetermined temperature; rotating the wafer; and supplying a process gas onto the wafer.
申请公布号 US2010075509(A1) 申请公布日期 2010.03.25
申请号 US20090563602 申请日期 2009.09.21
申请人 HIRATA HIRONOBU;YAJIMA MASAYOSHI;MORIYAMA YOSHIKAZU 发明人 HIRATA HIRONOBU;YAJIMA MASAYOSHI;MORIYAMA YOSHIKAZU
分类号 H01L21/316;B05C11/00 主分类号 H01L21/316
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