发明名称 NONVOLATILE SEMICONDUCTOR MEMORY AND METHOD OF MANUFACTURING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To prevent the degradation of element characteristics by disposing a terminal of a direction (x) of a source line contact on a dummy active region and by avoiding alignment displacement to the direction (x) of the source line contact. <P>SOLUTION: A nonvolatile semiconductor memory includes: a plurality of first active regions (AA) that are disposed along with the direction (x) in a memory cell array 100 and provided with a smaller dimension than a processing limit by exposure; a memory cell unit, provided in each of the plurality of the active regions AA having a memory cell (MC) and selection transistor (STS) to which a current path is connected in series along with a direction (y); and a straight line contact (LI) that is connected to an end of the memory cell unit and extended to the direction (x). In the memory, a region (SA) on which the straight line contact (LI) is disposed is a semiconductor region to which the plurality of the first active regions (AA) are connected by a second active region, and a bottom surface of the straight line contact (LI) is flat. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010056443(A) 申请公布日期 2010.03.11
申请号 JP20080222292 申请日期 2008.08.29
申请人 TOSHIBA CORP 发明人 SAKAGUCHI TAKESHI;NITTA HIROYUKI
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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