发明名称 |
COMPOUND, METHOD FOR PRODUCING THE COMPOUND AND RESIST COMPOSITION CONTAINING THE COMPOUND |
摘要 |
PURPOSE: A compound is provided to fully exploit autocatalytic reactions in which a strong acid is released anew through efficient decomposition by the action of the acid. CONSTITUTION: A compound is represented by formula (I) or (I'), wherein Z1 and Z2 independently represent a hydrogen atom, a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group, provided that at least one of Z1 and Z2 represents a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group; rings Y1 and Y2 independently represents an optionally substituted C3 to C20 alicyclic hydrocarbon group; and Q1 to Q4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, wherein Q'1 to Q'4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; and m and n independently represent an integer of 0 to 5. |
申请公布号 |
KR20100028000(A) |
申请公布日期 |
2010.03.11 |
申请号 |
KR20090082386 |
申请日期 |
2009.09.02 |
申请人 |
SUMITOMO CHEMICAL CO., LTD. |
发明人 |
TAKEMOTO ICHIKI;ANDO NOBUO;HATA MITSUHIRO |
分类号 |
C07C69/708;G03F7/004 |
主分类号 |
C07C69/708 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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