发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device for solving such problems as variations in performance of a resistance change element and deterioration in reliability, and to provide its manufacturing method. SOLUTION: The semiconductor device includes: a first electrode including a first metal; a first sidewall part comprising an oxide insulator of the first metal and formed in the circumference of the first electrode; a resistance change layer formed on the first electrode; a second electrode including a second metal and formed on the first electrode with the resistance change layer sandwiched in between; and a second sidewall part comprising the oxide insulator of the second metal and formed in the circumference of the second electrode. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010040728(A) 申请公布日期 2010.02.18
申请号 JP20080201408 申请日期 2008.08.05
申请人 NEC CORP 发明人 TERAI MASAYUKI
分类号 H01L27/10;H01L45/00;H01L49/00 主分类号 H01L27/10
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