发明名称 METHOD FOR ELECTROCHEMICALLY DEPOSITING A METAL ON A SUBSTRATE
摘要 To electroplate a metal layer which has silica particles dispersed therein, a method for electrochemically depositing a metal on a substrate, more specifically a method of forming a corrosion-resistant nickel multilayer on a substrate, are provided, wherein the method comprises the following method steps: (a) depositing a first nickel layer having a first electric potential, (b) depositing a second nickel layer having a second electric potential which is more negative than the first electric potential over the first nickel layer and (c) depositing a third nickel layer over the second nickel layer using a solution for electrochemically depositing a metal on a substrate, said solution containing ions of the metal to be deposited and silica particles, wherein at least one silicon containing organic moiety is provided to said silica particles, said silicon containing organic moiety comprising at least one functional group selected from the group comprising amino, quaternized ammonium, quaternized phosphonium and quaternized arsonium which imparts the silica particles a positive electric charge while being in contact with said solution.
申请公布号 CA2723827(A1) 申请公布日期 2010.01.21
申请号 CA20092723827 申请日期 2009.07.10
申请人 ATOTECH DEUTSCHLAND GMBH 发明人 MIDDEKE, HERMANN-JOSEF
分类号 C25D5/14;C23F13/02;C25D15/02 主分类号 C25D5/14
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