| 摘要 |
<p>PURPOSE: An exposure apparatus and a device manufacturing method are provided to obtain information indicating the surface state of the optical element of the illumination optical system in the exposure apparatus. CONSTITUTION: An exposure apparatus comprises an imaging optical system, an illumination optical system(21), a reflecting surface(301), and a processor. The imaging optical system has an optical element. The illumination optical system projects light to reticle. The reflecting surface reflects the light toward the optical element. The processor extracts information from signals and obtains information indicating the surface state of the optical element.</p> |
