| 摘要 |
PURPOSE: A method for correcting layout including a pitch change section is provided to prevent degradation of a contrast at a pitch change section by chopping a layout of the pitch change section. CONSTITUTION: A pattern layout including a pitch change section is arranged. The pitch change section is detected from the pattern layout(S100). Aerial image intensity of a region including the pitch change section is measured by a simulation operation(S110). A pitch of the layout of the pitch change section is corrected based on critical intensity(S120). The layout correction is performed by comparing the image intensity of a reference region with the image intensity of the pitch-corrected layout(S130,S150). |
