SUBSTRATE TRANSFER DEVICE OF THIN-FILM FORMING APPARATUS

摘要

Disclosed is a substrate transfer device for a thin-film deposition apparatus. In order to positively prevent plasma generated by electrodes (3) from coming into a rear surface of the substrate (4) and to attain cost reduction and improvement in maintenance without providing a mask panel (35) in a deposition chamber (1) with which the whole outer peripheral edge of the substrates (4) is masked, partition panels (37) each with an opening (36) larger than substrate (4) and facing the electrode (3) are arranged on a transfer carriage (23), a picture-frame-like substrate holder (38) with the substrate (4) fitted thereto being arranged on a side of the partition panel away from the electrode (3) such that the substrate (4) is arranged substantially at a center of the opening (36) of the partition panel (37) and the outer peripheral edge of the substrate holder (38) is masked with the partition panel (37).