发明名称 MEASUREMENT APPARATUS, MEASUREMENT METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <p>PURPOSE: A measuring device, a measuring method, an exposing device, and a method for manufacturing a device are provided to measure light intensity distribution of an aerial image through a slit by forming the aerial image on an image plane. CONSTITUTION: A stage(60) moves a slit(54). A light receiving element(53) includes at least two light receiving units receiving the light for receiving the light through the slit. A memory memorizes a distance relation to maximize the intensity of the light receiving the light receiving element. An operation unit operates an angle using the relation memorized in the memory unit and the detection result by the light receiving element. A stage driver(80) rotates the stage to make the angle 0 using the angle operated by the operation unit. The light receiving element includes a pixel array arranged in one dimension.</p>
申请公布号 KR20090115684(A) 申请公布日期 2009.11.05
申请号 KR20090038174 申请日期 2009.04.30
申请人 CANON KABUSHIKI KAISHA 发明人 OHKUBO AKINORI
分类号 H01L21/027;G01J1/00 主分类号 H01L21/027
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