| 发明名称 |
COMPOUND AND RADIATION-SENSITIVE COMPOSITION |
| 摘要 |
A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute pattern in a stable manner.
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| 申请公布号 |
US2009274977(A1) |
申请公布日期 |
2009.11.05 |
| 申请号 |
US20080519519 |
申请日期 |
2008.01.08 |
| 申请人 |
SHIMIZU DAISUKE;MARUYAMA KEN;KAI TOSHIYUKI;SHIMOKAWA TSUTOMU |
发明人 |
SHIMIZU DAISUKE;MARUYAMA KEN;KAI TOSHIYUKI;SHIMOKAWA TSUTOMU |
| 分类号 |
G03F7/039;C07C39/12;C07C43/20;C07C63/00 |
主分类号 |
G03F7/039 |
| 代理机构 |
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