| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an optical apparatus that is arranged so as to suppress an eccentric amount of an optical axis of a second optical system from an optical axis of a first optical system. <P>SOLUTION: The optical apparatus includes an eyepiece optical system 16 having a lens 16L located on the most object side and a photometric optical system 20 having a prism 21, wherein the prism 21 is arranged against the lens 16L on a positional relation that a part of effective light flux passing the lens 16L is made incident on the prism 21. <P>COPYRIGHT: (C)2010,JPO&INPIT |
