发明名称 PATTERN DRAWING APPARATUS, PATTERN DRAWING METHOD, METHOD FOR MAKING MASTER FOR MANUFACTURING INFORMATION RECORDING MEDIUM, AND METHOD FOR MAKING INFORMATION RECORDING MEDIUM
摘要 <P>PROBLEM TO BE SOLVED: To reduce the cost of manufacturing an information recording medium by alternately executing multiple times a partial drawing process and a drawing position changing process that changes drawing positions of the partial drawing process to draw an exposure pattern on a resin layer. Ž<P>SOLUTION: A pattern drawing apparatus is configured so as to draw the exposure pattern P for forming a concave and convex pattern for manufacturing the information recording medium. A beam-outputting unit is configured so as to output an electronic beam EB whose effective drawing width is narrower than the width and length of each pattern PSO1, PSO2, etc. A controller waits for a predetermined time period t1w, t2w, etc., after a reference signal S1 is output by a reference signal generator. Subsequently, the controller draws the exposure pattern P by causing the beam-outputting unit to output the electronic beam EB to alternately execute, multiple times, the partial drawing process that draws parts (drawing regions PSO11, PSO12, etc.) in the width direction in the patterns PSO1, PSO2, etc., and the drawing position changing process that changes the drawing position of the partial drawing process toward the center of rotation to an extent of the effective drawing width, while displacing each drawing position along the direction of rotation according to a skew angle θO by changing the waiting time every time the partial drawing process is performed. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009245581(A) 申请公布日期 2009.10.22
申请号 JP20090135646 申请日期 2009.06.05
申请人 TDK CORP 发明人 SOENO KEIICHI
分类号 G11B5/84;G03F7/20 主分类号 G11B5/84
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