发明名称 |
Cleaning of native oxide with hydrogen-containing radicals |
摘要 |
A substrate cleaning apparatus has a remote source to remotely energize a hydrogen-containing gas to form an energized gas having a first ratio of ionic hydrogen-containing species to radical hydrogen-containing species. The apparatus has a process chamber with a substrate support, an ion filter to filter the remotely energized gas to form a filtered energized gas having a second ratio of ionic hydrogen-containing species to radical hydrogen-containing species, the second ratio being different than the first ratio, and a gas distributor to introduce the filtered energized gas into the chamber.
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申请公布号 |
US7604708(B2) |
申请公布日期 |
2009.10.20 |
申请号 |
US20040778898 |
申请日期 |
2004.02.12 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
WOOD BINGXI SUN;KAWAGUCHI MARK N.;PAPANU JAMES S.;MOSELY RODERICK C.;LAI CHIUKUN STEVEN;KAO CHIEN-TEH;AI HUA;WANG WEI W. |
分类号 |
C23C16/00;C23C14/02;C23F1/00;H01J37/32;H01L21/00;H01L21/306;H01L21/311;H01L21/3213;H01L21/768 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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