METHOD FOR FORMING PATTERNED PHOTORESIST LAYER

摘要

PROBLEM TO BE SOLVED: To provide a new method for forming a patterned sloping photoresist layer.

SOLUTION: This method for forming the patterned photoresist layer wherein the patterned photoresist layer and a substrate have a contact angle that is not right-angle includes steps: for providing the substrate having the upper face and the lower face; for forming a photoresist layer on the upper face of the substrate; for providing a transparent layer on the photoresist layer; for providing a light-shielding layer on the transparent layer; for providing an exposure source supplying light passing the light-shielding layer and the transparent layer, and exposing the photoresist layer; and for developing the photoresist layer to form the patterned photoresist layer.

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