发明名称 WAFER BONDING METHOD AND BONDED WAFER STRUCTURE USING THE SAME
摘要 PURPOSE: A wafer bonding method is provided to improve throughput by performing a manufacturing process of various insulation wafers at a time. CONSTITUTION: A first wafer and a plurality of second wafers are provided(S10). A size of the first wafer is larger than a size of the second wafer. An intermediate material layer is formed in at least one among a bonding surface of the first wafer and a bonding surface of the second wafer(S20). A coefficient of thermal expansion of the intermediate material layer is larger than a coefficient of thermal expansion of the first wafer and the second wafer. The first wafer and the second wafers are bonded(S30).
申请公布号 KR20090106828(A) 申请公布日期 2009.10.12
申请号 KR20080032199 申请日期 2008.04.07
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, SANG JOON
分类号 H01L21/20 主分类号 H01L21/20
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