发明名称 |
WAFER BONDING METHOD AND BONDED WAFER STRUCTURE USING THE SAME |
摘要 |
PURPOSE: A wafer bonding method is provided to improve throughput by performing a manufacturing process of various insulation wafers at a time. CONSTITUTION: A first wafer and a plurality of second wafers are provided(S10). A size of the first wafer is larger than a size of the second wafer. An intermediate material layer is formed in at least one among a bonding surface of the first wafer and a bonding surface of the second wafer(S20). A coefficient of thermal expansion of the intermediate material layer is larger than a coefficient of thermal expansion of the first wafer and the second wafer. The first wafer and the second wafers are bonded(S30).
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申请公布号 |
KR20090106828(A) |
申请公布日期 |
2009.10.12 |
申请号 |
KR20080032199 |
申请日期 |
2008.04.07 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK, SANG JOON |
分类号 |
H01L21/20 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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