| 摘要 |
PROBLEM TO BE SOLVED: To provide a deposition apparatus capable of cleaning a mask having mask chips composed of silicon without removing the mask from a deposition apparatus, and a cleaning method of the mask. SOLUTION: The deposition apparatus includes: deposition chambers 110, 120 where a film material 32 is deposited on a surface 2a for deposition of a work 2 via a mask 1 having the mask chips 20 composed of silicon and possessing apertures corresponding to the prescribed patterns, and a support substrate 10 mounted with the mask chips 20; and a treatment chamber which is connected to the deposition chambers 110, 120, and is provided with a plasma treatment mechanism for cleaning the mask 1. COPYRIGHT: (C)2009,JPO&INPIT
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