发明名称 INJECTION TYPE PLASMA TREATMENT APPARATUS AND METHOD
摘要 The present invention relates to an injection type plasma treatment apparatus. An object of the present invention is to provide an injection type plasma treatment apparatus capable of treating work pieces with a variety of areas, sizes and shapes without damages due to micro arc streamer by using a method of injecting plasma, which is generated through dielectric barrier discharge (DBD) under the normal pressure condition, toward the work pieces. To this end, the injection type plasma treatment apparatus of the present invention comprises a power electrode plate which is provided in the reaction chamber in a state where a dielectric is formed on the power electrode plate; a ground electrode plate which is formed with a plurality of holes, defines a part of a wall of the reaction chamber, and cooperates with the power electrode plate to generate plasma therebetween when alternating current power is applied to the power electrode plate; and a gas supply unit which introduces reaction gas into the reaction chamber and injects the plasma in the reaction chamber to the outside through the holes in the ground electrode plate.
申请公布号 US2009200267(A1) 申请公布日期 2009.08.13
申请号 US20050996651 申请日期 2005.07.26
申请人 PSM, INC. 发明人 SHIM YEON KEON;BAEK JONG MOON;KIM DONG HOON;LEE HAE RYONG;LEE KEUN HO
分类号 B44C1/22;H05H1/24 主分类号 B44C1/22
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