| 摘要 |
A chemical vapor deposition device is provided to cut down a manufacturing cost by preventing the malfunction of the device. A chemical vapor deposition device comprises: a liquid material feeding unit(110) supplying the liquid material; a liquid material flux controller(120) controlling the flow rate of the liquid material; an injector(150) spraying the liquid material with the flow rate controlled by the liquid material flux controller; a trombone(160) vaporizing the emitted liquid fuel; a first heating unit(171) surrounding the trombone and heating the emitted liquid fuel; and a second heating unit(172) surrounding the injector and heating the liquid material. The first heating unit and the second heating unit comprise a coil connected to the power supply voltage. The power supply voltage is 10~14V. The liquid material comprises TEOS(tetraethoxysilane).
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