发明名称 |
METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing semiconductor device exposing a planarized upper portion of a projected electrode from the surface of a sealing resin without cutting an upper portion of the sealing resin. SOLUTION: In a status of an upper portion of a projected electrode 4 pressed to an inner surface of a cavity 8 of a metal mold 7 to clamp it, a resin is poured into the cavity 8 to seal the main surface of the substrate 1 and planarize the upper portion of the projected electrode 4 exposed from the surface of the sealing resin in the same plane of the resin surface. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2009141287(A) |
申请公布日期 |
2009.06.25 |
申请号 |
JP20070319033 |
申请日期 |
2007.12.11 |
申请人 |
PANASONIC CORP |
发明人 |
SHIMIZU YOSHIAKI;FUKUDA TOSHIYUKI |
分类号 |
H01L21/56;H01L23/12;H01L25/10;H01L25/11;H01L25/18 |
主分类号 |
H01L21/56 |
代理机构 |
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代理人 |
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地址 |
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