发明名称 METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for producing semiconductor device exposing a planarized upper portion of a projected electrode from the surface of a sealing resin without cutting an upper portion of the sealing resin. SOLUTION: In a status of an upper portion of a projected electrode 4 pressed to an inner surface of a cavity 8 of a metal mold 7 to clamp it, a resin is poured into the cavity 8 to seal the main surface of the substrate 1 and planarize the upper portion of the projected electrode 4 exposed from the surface of the sealing resin in the same plane of the resin surface. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009141287(A) 申请公布日期 2009.06.25
申请号 JP20070319033 申请日期 2007.12.11
申请人 PANASONIC CORP 发明人 SHIMIZU YOSHIAKI;FUKUDA TOSHIYUKI
分类号 H01L21/56;H01L23/12;H01L25/10;H01L25/11;H01L25/18 主分类号 H01L21/56
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