| 摘要 |
<p>A reticle for forming a microscopic pattern is formed that prevents a ghost image generated in a photolithography process for patterning microscopic-sized holes. The reticle may include a quartz substrate; a first pattern formed by exposing a portion of the surface of the quartz substrate; a second pattern surrounding the first pattern and including a phase shift layer; and a third pattern including an opaque layer around the second pattern.</p> |
